SUBSTRATE PROCESSING DEVICE

摘要

An upper air cleaning unit (5) is disposed above a cleaning region (4) provided in a conveying path, and said upper air cleaning unit (5) cleans the substrate (2) by spraying an air curtain onto the top surface of a substrate (2) and sucking in the sprayed air. A lower air cleaning unit is disposed below the conveying path in a position facing the upper air cleaning unit (5), and said lower air cleaning unit cleans the substrate (2) by spraying an air curtain onto the bottom surface of the substrate (2) and sucking up the sprayed air. The upper air cleaning unit (5) and the lower air cleaning unit spray air curtains such that on the substrate (2), said air curtains are crosswise to the direction in which the edge (3) extends. A substrate guide unit (13) is arranged in the cleaning region (4), and by means of the substrate guide unit (13) which supports the bottom surface of the substrate (2), the substrate (2) is prevented from contact with the lower air cleaning unit caused by the air suction by the lower air cleaning unit. By means of such a constitution, damage due to contact of the substrate (2) with the air cleaning units is avoided.