| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device restraining deterioration on uniformity of plasma treatment. <P>SOLUTION: The plasma treatment device includes: a treatment chamber 10 for performing plasma treatment on a substrate 20; a ground electrode 12 arranged inside the treatment chamber 10 and mounting the substrate 20 on its upper surface; an electrode plate 16 facing to the ground electrode 12 by sandwiching a plasma space 26; a high-frequency electrode 14 wherein the electrode plate 16 is electrically connected with a first primary surface of the high-frequency electrode 14 at a plasma space 26 side and a second primary surface of the high-frequency electrode 14 opposite to the first primary surface is connected with the high-frequency power supply 24; and a low-head hexagon bolt 18 wherein a thickness of a head part is at a range of 1-2 mm and the head part is made faced to the ground electrode 12 and the electrode plate 16 is fixed on the high-frequency electrode 14. <P>COPYRIGHT: (C)2011,JPO&INPIT |
