| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exposure mask, which includes a plurality of mask portions for forming wiring lines, the mask portions arranged parallel to one another and each having a width equal to or less than the minimum line width dimension determined by the resolution of an exposure apparatus, and which can give a wiring pattern made of a resist material having the same height while preventing the pattern from partially thinning. <P>SOLUTION: The exposure mask 19 to be used for exposure for forming a wiring pattern made of a resist material includes line portions arranged in parallel to one another and each having a width equal to or less than the minimum line width dimension determined by the resolution of an exposure apparatus. The line width of a portion 18a2, where only one side of the portion has an adjoining mask portion for forming a wiring line, is larger than the line width of a portion 18a1 where both sides of the portion have adjoining mask portions for forming wiring lines. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
