发明名称 ASYMMETRIC FRONT / BACK SOLDER MASK
摘要 A substrate including a die side interconnect pattern having a first solder mask thickness, and a board side interconnect pattern having a second solder mask thickness, where the second thickness is greater than the first thickness. Fabrication process using dry film solder mask can apply a first laminate thickness forming a die side solder mask, and a second laminate thickness forming a board side solder mask; the second thickness being greater than the first thickness. Fabrication process using a liquid solder resist can apply a first number of passes of solder resist forming a die side solder mask, and a second number of passes of solder resist forming a board side solder mask, where the board side thickness is greater than the die side thickness.
申请公布号 WO2011100451(A1) 申请公布日期 2011.08.18
申请号 WO2011US24377 申请日期 2011.02.10
申请人 QUALCOMM INCORPORATED;BCHIR, OMAR J.;HOLMES, JOHN P.;REYES, EDWARD 发明人 BCHIR, OMAR J.;HOLMES, JOHN P.;REYES, EDWARD
分类号 H01L21/48;H01L23/498 主分类号 H01L21/48
代理机构 代理人
主权项
地址