发明名称 SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE, AND MANUFACTURING METHODS THEREOF
摘要 <p>The present invention provides a method of manufacturing a gallium nitride (GaN) substrate on a heterogeneous substrate at low cost while realizing performance improvement and long operational lifespan of semiconductor devices, such as LEDs or laser diodes, which are manufactured using the GaN substrate. The semiconductor substrate includes a substrate, a first semiconductor layer arranged on the substrate, a mask arranged on a first region of the first semiconductor layer, a metallic material layer arranged on the first semiconductor layer and the mask, the metallic material layer being arranged in a direction intersecting the mask, a second semiconductor layer arranged on the first semiconductor layer and the metallic material layer, and a cavity in the first semiconductor layer and arranged under the metallic material layer.</p>
申请公布号 WO2011099685(A1) 申请公布日期 2011.08.18
申请号 WO2010KR06630 申请日期 2010.09.29
申请人 SEOUL OPTO DEVICE CO., LTD.;SAKAI, SHIRO 发明人 SAKAI, SHIRO
分类号 H01L21/20;H01L33/30 主分类号 H01L21/20
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