METHOD AND APPARATUS FOR DEPOSITING ATOMIC LAYERS ON A SUBSTRATE
摘要
<p>Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.</p>
申请公布号
WO2011099858(A1)
申请公布日期
2011.08.18
申请号
WO2011NL50100
申请日期
2011.02.11
申请人
NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO;VERMEER, ADRIANUS JOHANNES PETRUS MARIA;ROOZEBOOM, FREDDY;VAN DEELEN, JOOP
发明人
VERMEER, ADRIANUS JOHANNES PETRUS MARIA;ROOZEBOOM, FREDDY;VAN DEELEN, JOOP