发明名称 SOLID-STATE IMAGING DEVICE AND METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To improve the efficiency of photoelectric conversion in a solid-state image sensor wherein microfabrication of pixels is advanced. SOLUTION: The solid-state imaging device includes a pixel region where pixels comprising a photoelectric conversion part PD and a pixel transistor are two-dimensionally arrayed. The pixel includes an impurity diffusion region FD of a floating diffusion configuration part and a gate electrode 34 of the pixel transistor having a recess 45 where part of the impurity diffusion region FD enters when viewed from the upper surface. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011159758(A) 申请公布日期 2011.08.18
申请号 JP20100019600 申请日期 2010.01.29
申请人 SONY CORP 发明人 UCHIYAMA MASAYUKI;YAMADA AKITA;YAMAMOTO ATSUHIKO;KIDO HIDEO
分类号 H01L27/146;H04N5/335 主分类号 H01L27/146
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