发明名称 |
SOLID-STATE IMAGING DEVICE AND METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To improve the efficiency of photoelectric conversion in a solid-state image sensor wherein microfabrication of pixels is advanced. SOLUTION: The solid-state imaging device includes a pixel region where pixels comprising a photoelectric conversion part PD and a pixel transistor are two-dimensionally arrayed. The pixel includes an impurity diffusion region FD of a floating diffusion configuration part and a gate electrode 34 of the pixel transistor having a recess 45 where part of the impurity diffusion region FD enters when viewed from the upper surface. COPYRIGHT: (C)2011,JPO&INPIT
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申请公布号 |
JP2011159758(A) |
申请公布日期 |
2011.08.18 |
申请号 |
JP20100019600 |
申请日期 |
2010.01.29 |
申请人 |
SONY CORP |
发明人 |
UCHIYAMA MASAYUKI;YAMADA AKITA;YAMAMOTO ATSUHIKO;KIDO HIDEO |
分类号 |
H01L27/146;H04N5/335 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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