| 摘要 |
PROBLEM TO BE SOLVED: To provide a catalyst specifying method capable of obtaining an EPMA analyzing result of high precision without mapping a ghost signal while permitting the presence of an interface of low intensity between a catalyst coating layer capable of serving as the starting point of cracks with respect to the irradiation with an electron beam of high intensity and an embedded resin layer when EPMA analysis is executed under the conditions while the concentration of a catalyst is extremely low. SOLUTION: The catalyst specifying method for specifying the concentration or distribution of a metal catalyst in the catalyst coating layer 10 wherein the metal catalyst is supported on a matrix carrier is composed of a first step of forming a dummy layer 30 on the catalyst coating layer 10 and forming the embedded resin layer 20 on the dummy layer 30 and a second step of irradiating the embedded resin layer 20, the dummy layer 30 and the catalyst coating layer 10 with the electron beam using an electron probe microanalyzer (EPMA) for measuring the intensity of X rays inherent to the metal catalyst when irradiated with the electron beam to specify the concentration or distribution of the catalyst. COPYRIGHT: (C)2011,JPO&INPIT
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