发明名称 SURFACE PROCESSING METHOD FOR WIRING BOARD, AND WIRING BOARD PROCESSED BY THE SURFACE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a surface processing method for insulating layers and copper wiring that secures a reliability of insulation between wiring and adhesive strengths between a wiring surface and an insulating layer, and an insulating layer and an insulating layer without forming unevenness of >1,000 nm on a wiring surface, and shortens manufacturing step of a wiring board, and the wiring board processed by the surface processing method and having various superior reliabilities. SOLUTION: The surface processing method for the wiring board having insulating layers and a copper wiring formed on at least one principal surface of the insulating layer includes (I) a processing step of dissolving the insulating layer surface of the wiring board and (II) a processing step of forming unevenness on the copper wiring surface, parts of the step (I) and step (II) being carried out under the same processing conditions. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011159966(A) 申请公布日期 2011.08.18
申请号 JP20110001282 申请日期 2011.01.06
申请人 HITACHI CHEM CO LTD 发明人 YAMASHITA TOMOAKI;ITO SADAO;NAKAJIMA SUMIKO;INOUE FUMIO
分类号 H05K3/24;H05K3/38 主分类号 H05K3/24
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