METHOD FOR MANUFACTURING MICROSTRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a microstructure, wherein easy manufacturing of a metal microstructure having a high aspect ratio with a high degree of precision is achieved.

SOLUTION: The method for manufacturing a microstructure includes the following steps: a first step of forming a first insulating film on an Si substrate; a second step of exposing an Si surface by removing a part of the first insulating film; a third step of forming a recessed part by etching the Si substrate from the exposed Si surface; a fourth step of forming a second insulating film on a sidewall and a bottom of the recessed part; a fifth step of forming an Si exposed surface by removing at least a part of the second insulating film formed on the bottom of the recessed part; and a sixth step of filling the recessed part with a metal from the Si exposed surface by electrolytic plating.

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