| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem wherein one wafer is to be aligned accurately at a high speed to the other wafer regarding the two superposed wafers. SOLUTION: A position detector is equipped with: a first stage having a first substrate placed thereon; a first acquisition portion as a plurality of observers arranged opposite the first stage to acquire the image of the first substrate; an adjusting mechanism adjusting the mutual spaces of the observers configuring the first acquisition; a second stage arranged opposite the first stage to have a second substrate placed thereon; a second acquisition portion serving as at least one observer disposed opposite the second stage to acquire the image of the second substrate; and a control arithmetic operation portion computing the position of a first index for the first substrate by the first acquisition portion with the spaces of the observers being adjusted by the adjusting mechanism, and computing the position of a second index for the second substrate by the second acquisition portion. COPYRIGHT: (C)2011,JPO&INPIT |
