| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing device that performs proper dressing without accurately obtaining amount of abrasion of a dressing unit and a difference in dimension between devices. SOLUTION: When a polishing surface 233 of a polishing unit 232 is brought into contact with a dressing unit 332 of a dressing tool 33 by lowering a polishing tool 23 for dressing, a pressure detection unit 32 for detecting a downward pressure to be received by the dressing unit 332 from the polishing surface 233, and a control means 4 for controlling the moving amount of the polishing tool 23 in the vertical direction based on the pressure detected by the pressure detection unit 32 are added. The control means 4 adjusts the pressure of the polishing surface 233 in contact with the dressing unit 332 for proper dressing. COPYRIGHT: (C)2011,JPO&INPIT |
