METHOD OF CHEMICAL MECHANICAL POLISHING TUNGSTEN

摘要

A method of chemical mechanical polishing tungsten is disclosed in which a polishing solution includes an exciting agent and a strong oxidizing agent precursor. The polishing solution further includes an abrasive material, water, a pH modifier and a static etch rate inhibitor. The exciting agent is composed of nonferrous transition element metal salts and peroxides. The strong oxidizing agent precursor is transition metal compounds. The exciting agent in the polishing solution excites the strong oxidizing agent precursor, so that the polishing speed of tungsten is improved.