发明名称 POLISHING TOOL FOR SAPPHIRE SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a polishing tool for a sapphire substrate efficiently finishing the surface roughness within 0.01 &mu;m. <P>SOLUTION: The polishing tool for the sapphire substrate for smoothly machining the sapphire substrate 10, onto which an optical device layer is stacked, includes a base 46, and a polishing pad 47 fit on the lower surface of the base. The polishing pad is formed by sintering a mixture obtained by mixing silica particles and rubber particles. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011156648(A) 申请公布日期 2011.08.18
申请号 JP20100022767 申请日期 2010.02.04
申请人 DISCO ABRASIVE SYST LTD 发明人 FUWA TOKUHITO
分类号 B24D3/22;B24B37/24;B24D3/00 主分类号 B24D3/22
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