| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus improving its productivity by stably, continuously operating the irradiation of ion beams and raising the operation rate of the apparatus. SOLUTION: The substrate treatment apparatus includes an ion source for irradiating a target with the ion beams, a power source for driving the ion beams, and an overcurrent protection part 59 provided to the power source. The overcurrent protection part is provided with: an overcurrent set value-setting part 62 setting an overcurrent set value; an overcurrent value-determining part 63 for determining an overcurrent state if a current value is the overcurrent set value or more set in the set value-setting part; an overcurrent acceptable time-setting part 64 capable of setting the acceptable time in which the overcurrent state continues; and a determination part 65 for determining the lapse of the overcurrent acceptable time set in the overcurrent acceptable time-setting part. COPYRIGHT: (C)2011,JPO&INPIT
|
