发明名称 METHOD FOR FORMING CONTACT HOLE AND METHOD FOR PRODUCING LIQUID CRYSTAL DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a contact hole, in which the contact hole can surely be formed by preventing a pillar from being buried in an insulating layer. SOLUTION: The method for forming the contact hole includes the steps of: forming the pillar M on a substrate 20; forming the insulating layer 25 for covering the pillar M; expanding the pillar M to crack the insulating layer 25 partially and expose a part of the pillar M to the outside of the insulating layer 25; and removing the pillar M. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011158858(A) 申请公布日期 2011.08.18
申请号 JP20100022844 申请日期 2010.02.04
申请人 SEIKO EPSON CORP 发明人 TANAKA HIDEKI;KATO MAKOTO;MORIWAKI MINORU;ISHIHIRA HIROSHI
分类号 G02F1/1333 主分类号 G02F1/1333
代理机构 代理人
主权项
地址