发明名称 TOOL FOR SEMICONDUCTOR WAFER, AND METHOD OF PROCESSING SEMICONDUCTOR WAFER
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a tool for a semiconductor wafer and a method of processing a semiconductor wafer, which improve the strength of the semiconductor wafer and achieve reduction of facilities and cost. <P>SOLUTION: The tool provides a semiconductor wafer 1 with rigidity. A rigidity securing ring 2 having heat resistance is adhered to the periphery of the back-ground thin semiconductor wafer 1. The adhesion of the rigidity securing ring 2 to the periphery of the back-ground thin semiconductor wafer 1 increases the strength of the semiconductor wafer 1, thereby eliminating the need for back-grinding the inner region of the semiconductor wafer 1 while leaving the periphery of the semiconductor wafer 1. Thus, a device of dedicated use is eliminated and the facilities and the cost are reduced. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011159864(A) 申请公布日期 2011.08.18
申请号 JP20100021348 申请日期 2010.02.02
申请人 SHIN ETSU POLYMER CO LTD 发明人 ODAJIMA SATOSHI
分类号 H01L21/683;H01L21/301;H01L21/304 主分类号 H01L21/683
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