发明名称 VACUUM PROCESSING DEVICE, AND METHOD OF PROCESSING PARAMETER IN PLC
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a film-forming device capable of executing a process parameter of a data volume exceeding a finite memory volume, in the finite memory volume of a PLC, without degrading the throughput. <P>SOLUTION: A PLC system for controlling the film-forming device is constituted to include an operation computer for preparing a process recipe, and for storing the prepared process recipe; a next layer region P3, transferred sequentially with the process parameter processed in the next from the process recipe stored in the operation computer; a layer region P2 transferred sequentially with the process parameter stored in the next layer region P3; and a step execution area P1 read in sequentially with a command processed next, from among the process parameters stored in the layer region P2, and the commands stored in the step execution region P1 are sequentially executed a film is formed. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011159279(A) 申请公布日期 2011.08.18
申请号 JP20100272136 申请日期 2010.12.07
申请人 CANON ANELVA CORP 发明人 KANEKO SHIGEO
分类号 G05B19/05;C23C14/34;H01L21/205;H01L21/3065;H01L21/31 主分类号 G05B19/05
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