| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus for supplying a combustible processing fluid or its vapor to a substrate for processing, which is capable of lowering a concentration of an inflammable gas in exhaust by cooling the exhaust from a periphery of the substrate. SOLUTION: In the apparatus for cleaning a substrate W by supplying IPA which is the combustible processing fluid onto a surface Wf of the substrate W carried by a spin chuck 2 and having a liquid attached, an exhaust cooling unit 203 is inserted into an exhaust liquid line 202 for discharging an atmosphere containing fine particles of the liquid splashed from the spin chuck 2 and the substrate W and accepted by a processing cup 201 to be a float around the spin chuck. The exhaust flowing in the exhaust liquid line 202 is cooled by supplying a cooling coolant to the exhaust cooling unit 203, so as to lower the concentration of vapor of the combustible processing fluid included in the exhaust. Thus, the concentration of the vapor of the combustible processing fluid in the apparatus is lowered. COPYRIGHT: (C)2011,JPO&INPIT |
