发明名称 |
SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE, AND MANUFACTURING METHODS THEREOF |
摘要 |
PURPOSE: A semiconductor substrate and a manufacturing method thereof and a semiconductor device and a manufacturing method thereof are provided to improve the radiation characteristic of a laser diode by forming the laser diode in a semiconductor having higher thermal conductivity than that of a sapphire substrate. CONSTITUTION: In a semiconductor substrate and a manufacturing method thereof and a semiconductor device and a manufacturing method thereof, a first semiconductor layer(102) is formed on a first substrate(101). A metallic material layer(103) is formed on the first semiconductor layer by a predetermined pattern. A second semiconductor layer(104) is formed on the semiconductor layer and the metallic material layer. A cavity(102a) is formed on the first semiconductor layer instead of the metallic material layer. A hole is formed in the metallic material layer in forming the second semiconductor layer. |
申请公布号 |
KR20110093635(A) |
申请公布日期 |
2011.08.18 |
申请号 |
KR20110009261 |
申请日期 |
2011.01.31 |
申请人 |
SEOUL OPTO DEVICE CO., LTD. |
发明人 |
SAKAI SHIRO |
分类号 |
H01L33/20 |
主分类号 |
H01L33/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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