METHOD OF FORMING SURFACE PATTERN OF SAPHIRE, METHOD OF NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE, AND NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE

摘要

PURPOSE: A method for forming a sapphire surface pattern, a method for manufacturing a nitride semiconductor light emitting device using the same, and the nitride semiconductor light emitting device are provided to quickly and inexpensively form a sapphire surface pattern, thereby reducing total device processing time and processing costs. CONSTITUTION: A sapphire substrate is prepared. The surface of the sapphire substrate is exposed without an etching mask. A gas of at least one of CI2 and HCL2 is supplied onto the surface of the surface of the sapphire substrate. The surface of the sapphire substrate is etched.