发明名称 |
A PELLICLE FOR LITHOGRAPHY |
摘要 |
<p>PURPOSE: A pellicle for lithography is provided to suppress the deformation of a mask due to the attachment of the pellicle by pressurizing a pellicle frame based on a uniform pressure when the pellicle is attached to the mask. CONSTITUTION: A film adhesive(4) is formed at one side of a pellicle frame(2). A pellicle film(3) is bonded to the pellicle frame based on the adhesive. An adhesion layer(5) is formed at another side of the pellicle frame. The surface flatness of the adhesive layer is less than or equal to 10 um. A separator is attached to the adhesion layer. A concavo-convex part is capable of being formed on both sides of the pellicle frame.</p> |
申请公布号 |
KR20110092233(A) |
申请公布日期 |
2011.08.17 |
申请号 |
KR20110010664 |
申请日期 |
2011.02.07 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
SHIRASAKI TORU |
分类号 |
G03F1/64;H01L21/027 |
主分类号 |
G03F1/64 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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