| 摘要 |
A pattern measurement apparatus (100) includes a line profile creating unit (21) for creating a line profile of a pattern formed on a sample (7) by scanning with a charged particle beam (9), a derivative profile creating unit (22) for creating a second derivative profile by differentiating twice the line profile, and an edge detecting unit (23) for judging whether an edge in the pattern is a rising edge or a falling edge by use of two peak positions and two peak values appearing in the vicinity of an edge position of the pattern obtained from the second derivative profile. Assuming that the two peak positions appearing in the vicinity of the edge position of the pattern obtained from the second derivative profile are defined as X1 and X2 , X2 being larger than X1, the edge detecting unit (23) judges that the edge is a rising edge when a signal amount in the peak position X1 is larger than a signal amount in the peak position X2. |
