Use of a positive resist composition for immersion exposure, positive resist composition and immersion lithographic pattern-forming method using the same

摘要

A positive resist composition for immersion exposure comprises: (A) a resin capable of increasing its solubility in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, wherein the acid satisfies conditions of V ‰§ 230 and V/S ‰¦ 0.93 taking van der Waals volume of the acid as V (Å 3 ), and van der Waals surface area of the acid as S (Å 2 ).