发明名称 Methods to make fine patterns by exploiting difference of threshold laser fluence of materials and TFT fabrication methods using the same
摘要 Disclosed are methods of making fine patterns by exploiting difference in threshold laser fluence of materials and a thin film transistor (TFT) fabrication methods using the same, and more particularly, to a method of forming a fine pattern and a method of fabricating a TFT through the same method, in which a plurality of layers different in threshold laser fluence are stacked and then exposed to a laser so that a layer having a low threshold laser fluence can be selectively removed, thereby making fine patterns precisely and forming a cavity of a gate electrode precisely and easily.
申请公布号 GB2466083(B) 申请公布日期 2011.08.17
申请号 GB20090006956 申请日期 2009.04.23
申请人 KOREA INSTITUTE OF MACHINERY & MATERIALS 发明人 DONG-YOUN SHIN;TAIK-MIN LEE;DONG-SOO KIM
分类号 H01L51/00;H01L21/336;H01L51/05 主分类号 H01L51/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利