发明名称 |
Mask pattern data creation method and mask |
摘要 |
A mask pattern data creation method includes: determining whether or not a spacing of adjacent assist pattern feature data is not more than a prescribed spacing, based on: initial position data indicating an initially set position of the assist pattern feature data determined based on an illumination condition; and initial size data indicating an initially set size of the assist pattern feature data satisfying a size condition to not optically form an image on the transfer destination; and moving at least one of the adjacent assist pattern feature data or reducing a size of the at least one to increase the spacing of the assist pattern feature data to exceed a prescribed spacing in the case where it is determined that the spacing of the assist pattern feature data is not more than the prescribed spacing.
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申请公布号 |
US7998642(B2) |
申请公布日期 |
2011.08.16 |
申请号 |
US20090478479 |
申请日期 |
2009.06.04 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
KODAMA CHIKAAKI;ICHIKAWA HIROTAKA;MASUKAWA KAZUYUKI;KOTANI TOSHIYA |
分类号 |
G03F1/36;G03F1/68;G03F1/70 |
主分类号 |
G03F1/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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