| 摘要 |
A particle supply apparatus for supplying particles to a supply destination is disclosed that includes a particle supply apparatus main frame, a particle accommodating unit that accommodates the particles, a gas spouting unit that is arranged at a bottom portion of the particle accommodating unit and is configured to spout gas toward the particles, and a conveying mechanism that applies suction to the particles accommodated in the particle accommodating unit and conveys the particles toward the supply destination. The particle accommodating unit is installed in the particle supply apparatus main frame and is arranged to rest on a face at the bottom portion side during operation, and the particle accommodating unit is detached from the particle supply apparatus main frame and is arranged to rest on a face other than the face at the bottom portion side during transportation.
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