发明名称 |
Photomask and pattern formation method using the same |
摘要 |
A photomask includes a transparent substrate having a transparent property against exposing light, a semi-light-shielding portion formed on the transparent substrate, a first opening formed in the semi-light-shielding portion and having a first dimension and a second opening formed in the semi-light-shielding portion and having a second dimension lager than the first dimension. A phase-shifting portion which transmits the exposing light in an opposite phase with respect to the first opening is formed on the transparent substrate around the first opening. A light-shielding portion is formed on the transparent substrate around the second opening.
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申请公布号 |
US7998641(B2) |
申请公布日期 |
2011.08.16 |
申请号 |
US20080200478 |
申请日期 |
2008.08.28 |
申请人 |
PANASONIC CORPORATION |
发明人 |
IRIE SHIGEO;MISAKA AKIO;NONAMI YUJI;NAKAMURA TETSUYA;HARADA CHIKA |
分类号 |
G03F1/29;G03F1/32;G03F1/68;G03F7/00;G03F9/00;H01L21/027 |
主分类号 |
G03F1/29 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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