发明名称 |
PHASE CHANGE RECORDING FILM HAVING HIGH ELECTRICAL RESISTANCE AND SPUTTERING TARGET FOR FORMING PHASE CHANGE RECORDING FILM |
摘要 |
<p>PURPOSE: A phase change recording layer with high electric resistance and a sputtering target for forming the same are provided to reduce the property of a phase change type nonvolatile memory layer and reduce manufacturing costs by reducing a current in a record erasing operation. CONSTITUTION: A phase change recording layer has a variable electric resistance property. The phase change recording layer includes Ge of 17 to 25%, Sb of 17 to 25%, and C of 0.5 to 6%. The rest of the phase change recording layer is made of Te and impurities. The resistivity of the phase change recording layer by is 5 x 10^-2 to 5 x 10^1ΩCm.</p> |
申请公布号 |
KR20110091844(A) |
申请公布日期 |
2011.08.16 |
申请号 |
KR20110072893 |
申请日期 |
2011.07.22 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD.;MITSUBISHI MATERIALS CORPORATION |
发明人 |
HORII HIDEKI;MORI SATORU;HA, YONG HO;PARK, JEONG HEE;KINOSHITA KEI;NONAKA SOHEI |
分类号 |
H01L21/20;H01L21/8247;B41M5/26;G11B7/0045;G11B7/243;H01L21/203;H01L27/115 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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