发明名称 Semiconductor device and manufacturing method thereof
摘要 The present invention provides a technique capable of suppressing variations in the height of each solder ball where an NSMD is used as a structure for each land. Vias that extend through a wiring board are provided. Lands are formed at the back surface of the wiring board so as to be coupled directly to the vias respectively. The lands are respectively formed so as to be internally included in openings defined in a solder resist. Half balls are mounted over the lands respectively. Namely, the present invention has a feature in that the configuration of coupling between each of the lands and its corresponding via both formed at the back surface of the wiring board is taken as a land on via structure and a configuration form of each land is taken as an NSMD.
申请公布号 US7998796(B2) 申请公布日期 2011.08.16
申请号 US20100880417 申请日期 2010.09.13
申请人 RENESAS ELECTRONICS CORPORATION 发明人 DANNO TADATOSHI
分类号 H01L21/50;H01L21/44;H01L21/48 主分类号 H01L21/50
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