| 发明名称 |
SYSTEM UND VERFAHREN ZUM ELEKTRONENSTRAHLSCHREIBEN |
| 摘要 |
A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received information. |
| 申请公布号 |
AT519220(T) |
申请公布日期 |
2011.08.15 |
| 申请号 |
AT20060838855T |
申请日期 |
2006.11.30 |
| 申请人 |
CADENCE DESIGN SYSTEMS, INC. |
发明人 |
LAPANIK, DMITRI;MATSUSHITA, SHOHEI;MITSUHASHI, TAKASHI;WU, ZHIGANG |
| 分类号 |
H01J37/302;H01J37/317 |
主分类号 |
H01J37/302 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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