| 摘要 |
25 ABSTP4CF POLISHING COMPOSITION THE PRESENT INVENTION PROVIDES A POLISHING COMPOSITION CONTAINING AN OIAANIC NITROCEN-COMAINING COMPOUND, AN ORGANIC POLYBASIC ACID, AN ABRASIVE. AND WATER. WHEREIN THE ORGANIC NIIIOGGEN-CONTAININO COMPOUND HAS IN THE 5 MOLECULE TWO OR MORE AMINO GROUPS, TWO OF MORE IMINO GROUPS, OR ONE OF MORE AMINO GROUPS AND ONE OR MORE IMINO GROUPS- A METHOD FOR MANUFACTURING A .TL 7 - SUBSTRATE WITH THE POLISHING COMPOSITION-, AND A METHOD FOR REDUCING SURFACE STAINS OF A SUBSTRATE WITH THE POLISHING COMPOSITION. THE POLISHING COMPOSITION CAN BE SUITABLY USED, FOR EXAMPLE, IN THE MANUFACTURING STEP FOR A SUBSTRATE FOR A 10 HARD DISK SUCH AS A MEMORV HARD DISK.
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