发明名称 INTEGRATED FILTER STRUCTURE HAVING IMPROVED INTERCHANNEL ISOLATION AND METHOD OF MANUFACTURE
摘要 In one embodiment, a filter structure includes first and second filter devices formed using a semiconductor substrate. A vertical ground plane structure prevents cross-coupling between the first and second filter devices.
申请公布号 HK1116934(A1) 申请公布日期 2011.08.12
申请号 HK20080105431 申请日期 2008.05.16
申请人 SEMICONDUCTOR COMPONENTS INDUSTRIES L.L.C. 发明人 SUDHAMA C. SHASTRI C.;YENTING WEN
分类号 H03H 主分类号 H03H
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