发明名称 |
Projection System, Lithographic Apparatus, Method of Projecting a Beam of Radiation onto a Target and Device Manufacturing Method |
摘要 |
A projection system (PS) is provided that includes a sensor system (20) that measures at least one parameter that relates to the physical deformation of a frame (10) that supports the optical elements (11) within the projection system (PS), and a control system (30) that, based on the measurements from the sensor system (20), determines an expected deviation of the position of the beam of radiation projected by the projection system (PS) that is caused by the physical deformation of the frame (10). |
申请公布号 |
US2011194088(A1) |
申请公布日期 |
2011.08.11 |
申请号 |
US200913002840 |
申请日期 |
2009.07.13 |
申请人 |
AMSL NETHERLANDS B.V. |
发明人 |
BUTLER HANS;DE JONGH ROBERTUS JOHANNES MARINUS;VAN DER WIJST MARC WILHELMUS MARIA;TOUSAIN ROBERTUS LEONARDUS;OUDE NIJHUIS MARCO HENDRIKUS HERMANU;KOEVOETS ADRIANUS HENDRIK |
分类号 |
G03B27/54 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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