| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoresist base material and a photoresist composition, having excellent coating solvent dissolvability, high transparency, high sensitivity, high microfabrication properties, high strength, and low outgas properties, and to provide a precursor of an acid-dissociative dissolution-inhibiting group constituting a part of a photoresist base material. <P>SOLUTION: The photoresist composition includes a compound represented by formula (1) (wherein, R is a group having a benzenecarboxylic acid ester site and an aliphatic condensed ring site; R<SP>1</SP>is a group such as hydroxy and alkoxy; and R<SP>2</SP>is hydrogen). <P>COPYRIGHT: (C)2011,JPO&INPIT |
