| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method, capable of increasing the allowed dimensional errors of a diffraction grating, without the use of an intermediate layer. <P>SOLUTION: In an exposure method, a laser beam is input vertically to an incident face 3a of a diffraction grating 3 that has a planar support 31 and a diffraction section 32, where a part 32b having a refractive index different from that of the support 31 and having a rectangular cross section is formed with the support 31, in an alternate and periodic manner. Exposure is carried out on an object, while the height of the part 32b, having a rectangular cross section in the diffraction part 32, is set so that the intensity of the 0th-order and ±second-order or higher diffraction beams of the diffraction grating 3 are 11% or less of the intensity of the ±first-order diffraction beam. <P>COPYRIGHT: (C)2011,JPO&INPIT |
