发明名称 |
METHOD AND APPARATUS FOR DEPOSITING NANOSTRUCTURED THIN LAYERS WITH CONTROLLED MORPHOLOGY AND NANOSTRUCTURE |
摘要 |
A method for producing, by means of plasma, nanostructured thin layers particularly of the hierarchically organized type, and an apparatus for implementing the method, are described. At least a first chamber (10) is provide in which are present an injector (14) of a reagent gas, means (31, 31') for feeding inert gases, and an antenna (16) for the creation of a plasma in said first chamber. Enclosing said first chamber is a second chamber (11) to which a pumping system is connected, containing a housing for the substrate (35) on which the nanostructured film is produced. A wall (12) separates said first chamber from said second chamber and has at least one opening (13). The injector and antenna are arranged in the first chamber with a geometry such that the distance between the outlet of said injector is at a distance of no more than 5 cm from the plane of the surface of said antenna farther from said wall, and said surface is at a distance of no more than 5 cm from said opening. |
申请公布号 |
WO2011064392(A3) |
申请公布日期 |
2011.08.11 |
申请号 |
WO2010EP68539 |
申请日期 |
2010.11.30 |
申请人 |
UNIVERSITA' DEGLI STUDI DI MILANO BICOCCA;POLITECNICO DI MILANO;RICCARDI, CLAUDIA;PISELLI, MORENO;FUMAGALLI, FRANCESCO SIRIO;DI FONZO, FABIO;BOTTANI, CARLO ENRICO |
发明人 |
RICCARDI, CLAUDIA;PISELLI, MORENO;FUMAGALLI, FRANCESCO SIRIO;DI FONZO, FABIO;BOTTANI, CARLO ENRICO |
分类号 |
C23C16/44;C23C16/513 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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地址 |
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