发明名称 SEMICONDUCTOR WAFER AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor wafer capable of performing the exact evaluation of impurity distribution under a gate without giving damage to a silicon substrate, and a method for manufacturing the same. SOLUTION: The semiconductor wafer has a dummy filling unit with a W-shaped cross-sectional shape in a monitor region established in a predetermined place on the semiconductor substrate which has no electrical connection with the other unit. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011155273(A) 申请公布日期 2011.08.11
申请号 JP20110046182 申请日期 2011.03.03
申请人 FUJITSU SEMICONDUCTOR LTD 发明人 HASHIMI KAZUO;SATO TAKEKAZU
分类号 H01L29/78;H01L21/66;H01L21/822;H01L27/04 主分类号 H01L29/78
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