发明名称 WAFER EDGE EXPOSURE MODULE
摘要 A wafer edge exposure module connected to a semiconductor wafer track system. The wafer edge exposure module includes a wafer spin device, an optical system, a scanner interface module, and a controller. The wafer spin device supports a wafer for processing. The optical system directs exposure light on a respective edge portion of the wafer simultaneously to create a dummy track on the edge of the wafer. The scanner interface module sends and/or receives dummy edge exposure information from a scanner via a computer network. The controller receives the dummy edge exposure information from the scanner interface module and uses the exposure information to control the optical system.
申请公布号 US2011194086(A1) 申请公布日期 2011.08.11
申请号 US20100702601 申请日期 2010.02.09
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHIEN TSUNG-CHIH;CHEN YUNG-CHENG;LEE HENG-JEN
分类号 G03B27/52 主分类号 G03B27/52
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