| 摘要 |
<p>A solid-state thin film forming method uses an electron source electrode that emits ballistic electrons, quasi-ballistic electrons, or hot electrons from an electron emission surface having a predetermined shape into a liquid or a liquid phase material, immerses the electron source electrode in a solution containing solid element ions, and activates the electron source electrode, thereby forming a solid-state thin film on the electron emission surface of the electron source electrode. This can provide a new solid-state thin film forming method that simultaneously satisfies demands for a low energy consumption, a low environmental load, a very small size, and a large scale integrated array.</p> |
