| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus that allows fast replacement of a remaining gas inside a vacuum processing chamber with an introduced gas. SOLUTION: The vacuum processing apparatus is configured to process a sample 117 by a plurality of processing steps for introducing a different gas into a vacuum processing chamber 109, respectively. When continuing the plurality of processing steps, a gas flow rate at the end of the previous step is reduced from a set value during regular processing or a gas flow rate at the start of the following step is increased from the set value. Alternatively, the gas flow rate at the end of the previous step is reduced from the set value and the gas flow rate at the start of the following step is increased from the set value. By this arrangement, it allows fast replacement and achieves stable vacuum processing. COPYRIGHT: (C)2011,JPO&INPIT
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