发明名称 SEMICONDUCTOR DEVICE AND FABRICATING METHOD THEREOF
摘要 The present invention provides a semiconductor device and a fabricating method thereof. The fabricating method comprises: providing a first substrate; forming a soft dry film having an adhesive film and a release film; sticking the soft dry film on the first substrate with the adhesive film; removing the release film; sticking a second substrate on the adhesive film; and heating the adhesive film to solidify the adhesive film to form a solid adhesive film. The semiconductor device comprises: a first substrate, a solid adhesive film, and a second substrate. The solid adhesive film is formed on the first substrate, and the second substrate is formed on the solid adhesive film.
申请公布号 US2011195257(A1) 申请公布日期 2011.08.11
申请号 US20100701615 申请日期 2010.02.08
申请人 HSIUNG HSIN-CHANG;HO SHU-LIN 发明人 HSIUNG HSIN-CHANG;HO SHU-LIN
分类号 B32B27/38;B32B38/10;H01L21/50 主分类号 B32B27/38
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