发明名称 |
THIN-FILM INSPECTION APPARATUS AND INSPECTION METHOD |
摘要 |
An object is to reduce the effect of a film thickness variation on the substrate surface of a thin film and improve the measuring accuracy. Provided are a light source that radiates single-wavelength light to an inspection-target substrate (W), which is formed by forming a thin film on a glass substrate from the glass substrate side; a light receiving element that is disposed such that the light receiving axis intersects with the optical axis of illumination light emitted from the light source at a predetermined inclination angle and that receives diffused transmitted light that has been transmitted through the inspection-target substrate W; and a computer (7) that obtains a haze ratio of the thin film on the basis of the intensity of the light received by the light receiving element. The computer (7) has a haze ratio characteristic made by associating the haze ratio and the light intensity of the diffused transmitted light and obtains a haze ratio by using the haze ratio characteristic and the light intensity received by the light receiving element.
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申请公布号 |
US2011194113(A1) |
申请公布日期 |
2011.08.11 |
申请号 |
US200913120319 |
申请日期 |
2009.07.02 |
申请人 |
MITSUBISHI HEAVY INDUSTRIES, LTD. |
发明人 |
SAKAI SATOSHI;KAWAZOE KOHEI;YAMAGUCHI KENGO;TAKANO AKEMI |
分类号 |
G01N21/47 |
主分类号 |
G01N21/47 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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