| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve a mark detection rate of a semiconductor manufacturing apparatus. <P>SOLUTION: In a position detecting method which detects a position of a detection mark, a template which is for specifying an edge position of the detection mark is retained, and matching processing using the template is performed for an image including the detection mark. In this case, in the template, all edge positions corresponding to edges toward the same direction are moved to the same direction or the opposite direction and accordingly the template is changed; and when degree of correlation to be calculated in the matching processing is other than a predetermined determination threshold, the matching processing is repeated while changing the template by the method to perform position detection based on the result of the matching processing. <P>COPYRIGHT: (C)2011,JPO&INPIT |
