发明名称 CHALCOGENIDE-CONTAINING PRECURSORS, METHODS OF MAKING, AND METHODS OF USING THE SAME FOR THIN FILM DEPOSITION
摘要 <p>Disclosed are chalcogenide-containing precursors for use in the manufacture of semiconductor, photovoltaic, LCD-TFT1 or fiat panel type devices. Also disclosed are methods of synthesizing the chalcogenide- containing precursors and vapor deposition methods, preferably thermal ALD, using the chaicogenide-containing precursors to form chaicogenide-containing films.</p>
申请公布号 WO2011095849(A1) 申请公布日期 2011.08.11
申请号 WO2010IB56118 申请日期 2010.12.29
申请人 L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE;GATINEAU, JULIEN;MINOURA, MAO;ISHII, HANA 发明人 GATINEAU, JULIEN;MINOURA, MAO;ISHII, HANA
分类号 C23C16/30;C01B19/00;C23C16/18 主分类号 C23C16/30
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