| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern of an excellent shape can be obtained. <P>SOLUTION: The resist composition includes a quencher (Q) satisfying expression (I): ΔD<SP>a</SP>-ΔD<SP>b</SP>>ΔD<SP>c</SP>-ΔD<SP>d</SP>, wherein ΔD<SP>a</SP>represents the absolute value of the difference between d<SP>1</SP>and d<SP>a</SP>;ΔD<SP>b</SP>represents the absolute value of the difference between d<SP>1</SP>and D<SP>b</SP>; ΔD<SP>c</SP>represents the absolute value of the difference between d<SP>1</SP>and d<SP>c</SP>; and ΔD<SP>d</SP>represents the absolute value of the difference between d<SP>1</SP>and d<SP>d</SP>. <P>COPYRIGHT: (C)2011,JPO&INPIT |
