发明名称
摘要 PROBLEM TO BE SOLVED: To provide a patterning base plate for cell culture, allowing adhesion of cells onto a base material in a highly precise pattern shape and capable of being used for culturing the cells, and to provide a cell culture base plate formed by adhesion of the cells thereto in the highly precise pattern shape. SOLUTION: This patterning base plate has the base material, a photocatalyst-containing layer, and a cell adhesion inhibiting layer, wherein the photocatalyst-containing layer is formed on the base material and contains at least a photocatalyst, and the cell adhesion inhibiting layer is formed on the photocatalyst-containing layer and contains a cell adhesion inhibiting material having cell adhesion inhibiting properties of inhibiting adhesion to the cells and decomposed or denatured by action of the photocatalyst due to energy irradiation. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP4742599(B2) 申请公布日期 2011.08.10
申请号 JP20050020333 申请日期 2005.01.27
申请人 发明人
分类号 C12M3/00;C12M3/04;C12N5/02 主分类号 C12M3/00
代理机构 代理人
主权项
地址