发明名称 METHOD FOR PREPARATION OF MOO3-PT THIN FILMS HAVING BI-LAYERED STRUCTURE BY ELECTROCHEMICAL DEPOSITION AND MOO3-PT THIN FILMS PREPARED BY THE METHOD
摘要 PURPOSE: An MoO3-Pt film and a method of manufacturing the film having a double-layer structure by electrochemical deposition are provided to save a manufacturing cost by decrease in the amount of Pt due to addition of an appropriate amount of MoO3 and increase catalytic activity and stability of an electrode. CONSTITUTION: A method of manufacturing a MoO3 film having a double-layer structure by electrochemical deposition comprises next steps. Chloroplatinic-acid electrolyte solution is manufactured. Molybdenum electrolyte solution is manufactured. After a substrate is dipped into the manufactured chloroplatinic-acid electrolyte solution, a Pt film is manufactured on the substrate through electrochemical deposition. After the Pt-film bearing substrate is dipped into the manufactured Molybdenum electrolyte solution, a double-layer structure of a MoO3-Pt film is manufactured through electrochemical deposition.
申请公布号 KR20110090874(A) 申请公布日期 2011.08.10
申请号 KR20110073558 申请日期 2011.07.25
申请人 INHA-INDUSTRY PARTNERSHIP INSTITUTE 发明人 BAECK, SUNG HYEON;SHIN, JU KYUNG;KIM, KYUNG HWA;JEONG, SO MI;TAK, YOUNG SUG
分类号 C25D5/10;C25D3/50;C25D3/54 主分类号 C25D5/10
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