发明名称 |
METHOD FOR PREPARATION OF MOO3-PT THIN FILMS HAVING BI-LAYERED STRUCTURE BY ELECTROCHEMICAL DEPOSITION AND MOO3-PT THIN FILMS PREPARED BY THE METHOD |
摘要 |
PURPOSE: An MoO3-Pt film and a method of manufacturing the film having a double-layer structure by electrochemical deposition are provided to save a manufacturing cost by decrease in the amount of Pt due to addition of an appropriate amount of MoO3 and increase catalytic activity and stability of an electrode. CONSTITUTION: A method of manufacturing a MoO3 film having a double-layer structure by electrochemical deposition comprises next steps. Chloroplatinic-acid electrolyte solution is manufactured. Molybdenum electrolyte solution is manufactured. After a substrate is dipped into the manufactured chloroplatinic-acid electrolyte solution, a Pt film is manufactured on the substrate through electrochemical deposition. After the Pt-film bearing substrate is dipped into the manufactured Molybdenum electrolyte solution, a double-layer structure of a MoO3-Pt film is manufactured through electrochemical deposition.
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申请公布号 |
KR20110090874(A) |
申请公布日期 |
2011.08.10 |
申请号 |
KR20110073558 |
申请日期 |
2011.07.25 |
申请人 |
INHA-INDUSTRY PARTNERSHIP INSTITUTE |
发明人 |
BAECK, SUNG HYEON;SHIN, JU KYUNG;KIM, KYUNG HWA;JEONG, SO MI;TAK, YOUNG SUG |
分类号 |
C25D5/10;C25D3/50;C25D3/54 |
主分类号 |
C25D5/10 |
代理机构 |
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主权项 |
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地址 |
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