| 摘要 |
PURPOSE: A silica-based film forming material for air gap formation is provided to form an air gap with large aperture without the filling into a concave part when applied by a spin coating method. CONSTITUTION: A silica-based film forming material for air gap formation comprises (a) siloxane polymers obtained by hydrolyzing and condensing a silane compound represented by chemical formula (1): R^1_nSi(OR^2)_(4-n), (b) alkanolamine, and (c) organic solvents. In chemical formula 1, R^1 is hydrogen atoms or C1-20 alkyl group or aryl group; R^2 is a monovalent organic group; and n is the integer of 0-2. The mass average molecular weight of the siloxane polymer is 3,000-1,000,000. |
