Method for producing a structured TCO protection layer

摘要

Producing a coated substrate, comprises depositing transparent conductive oxide (TCO)-layer (2) with a thickness of 100-1000 nm on a substrate (1), depositing an inert layer (3) with an average layer thickness of 0.5-5 nm on the TCO-layer, heating the substrate at 550-800[deg] C and then etching in an acid, where the inert layer is not removed prior to etching. An independent claim is included for the coated substrate comprising the substrate, TCO layer and inert layer.